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反応性RFイオンプレーティング法によるBN皮膜の形成
http://hdl.handle.net/10258/105
http://hdl.handle.net/10258/10516feb4eb-23b3-43ad-8bad-1320c76d07c2
名前 / ファイル | ライセンス | アクション |
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52_toukou09.pdf.pdf (490.3 kB)
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Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
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公開日 | 2007-05-25 | |||||
タイトル | ||||||
言語 | ja | |||||
タイトル | 反応性RFイオンプレーティング法によるBN皮膜の形成 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Preparation of BN Films by Ractive RF Ion Plating Method | |||||
言語 | ||||||
言語 | jpn | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | boron nitride films | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | RF ion plating | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | departmental bulletin paper | |||||
アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
著者 |
佐藤, 忠夫
× 佐藤, 忠夫× 若柳, 俊一× 渡邉, 孝幸× 酒井, 彰 |
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室蘭工業大学研究者データベースへのリンク | ||||||
酒井 彰(SAKAI Akira) | ||||||
http://rdsoran.muroran-it.ac.jp/html/100000158_ja.html | ||||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | The sp2-bonded BN thin films were prepared onto the silicon substrate by RF ion plating under the conditions of supplied RF power of 18-110 W, substrate bias potential of -0.5kV, boron evaporation rate of 1.3 × 10-4kg/(㎡・s), vacuum chamber pressure of pN2+pAr=6.6 × 10-2Pa, and 21.7cm distance between substrate and vapar source. N/B atomic ratio of thc film increased with increases in pN2/(pN2+pAr) ratio and supplied RF power, The maximum ratio of the film oblained in this work was 0,95, when the film was prepared under the condition of supplied RF power of 110 W and pN2 =6.6×10-2Pa. | |||||
言語 | en | |||||
書誌情報 |
ja : 室蘭工業大学紀要 en : Memoirs of the Muroran Institute of Technology 巻 52, p. 149-154, 発行日 2002-11-30 |
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注記 | ||||||
内容記述タイプ | Other | |||||
内容記述 | 投稿論文 | |||||
言語 | ja | |||||
出版者 | ||||||
言語 | ja | |||||
出版者 | 室蘭工業大学 | |||||
論文ID(NAID) | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | NAID | |||||
関連識別子 | 110000076602 | |||||
日本十進分類法 | ||||||
主題Scheme | NDC | |||||
主題 | 431 | |||||
ISSN | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 13442708 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA11175464 | |||||
権利 | ||||||
言語 | ja | |||||
権利情報 | © 2002 室蘭工業大学 | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf |