{"created":"2023-06-19T10:27:56.712158+00:00","id":7118,"links":{},"metadata":{"_buckets":{"deposit":"afbea26a-3764-422e-beba-28f32e0206f7"},"_deposit":{"created_by":18,"id":"7118","owners":[18],"pid":{"revision_id":0,"type":"depid","value":"7118"},"status":"published"},"_oai":{"id":"oai:muroran-it.repo.nii.ac.jp:00007118","sets":["216:292","216:407:314","46"]},"author_link":["43029","43027","43028","4713"],"item_79_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2011-06-10","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"2","bibliographicPageEnd":"353","bibliographicPageStart":"348","bibliographicVolumeNumber":"19","bibliographic_titles":[{"bibliographic_title":"日本AEM学会誌","bibliographic_titleLang":"ja"}]}]},"item_79_description_23":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_79_description_7":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The microwave excited surface wave plasma process enables us to do less damage processing by active neutral gaseous and wide area processing. On the other hand, the surface wave plasma is strong coupling phenomena of microwave and plasma, and detail understanding of the phenomena by any pure analytical methods is not easy. Authors have been working in development of numerical simulation tool for this equipment by using FDTD method. So far the FDTD method with appropriate plasma macro model which is partially based on experimental data of electron density was proposed and good agreements with experimental results was obtained. As the next stage of the development of the numerical code, this paper presents estimation of electron density distribution in simulation.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_79_link_5":{"attribute_name":"室蘭工業大学研究者データベースへのリンク","attribute_value_mlt":[{"subitem_link_text":"川口 秀樹（KAWAGUCHI Hideki）","subitem_link_url":"http://rdsoran.muroran-it.ac.jp/html/100000127_ja.html"},{"subitem_link_text":"鏡 愼（KAGAMI Shin）","subitem_link_url":"http://rdsoran.muroran-it.ac.jp/html/100000070_ja.html"}]},"item_79_publisher_11":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"日本AEM学会","subitem_publisher_language":"ja"}]},"item_79_relation_15":{"attribute_name":"論文ID（NAID）","attribute_value_mlt":[{"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"110008673752","subitem_relation_type_select":"NAID"}}]},"item_79_rights_19":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"Copyright 2011 日本ＡＥＭ学会 ダウンロードを含むこの著作物の利用は、著作権法の私的使用及び引用の範囲に限り認められます。その範囲外の利用については、日本ＡＥＭ学会の承諾が必要です。","subitem_rights_language":"ja"}]},"item_79_source_id_12":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09194452","subitem_source_identifier_type":"PISSN"}]},"item_79_source_id_14":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN10457520","subitem_source_identifier_type":"NCID"},{"subitem_source_identifier":"AA11512429","subitem_source_identifier_type":"NCID"}]},"item_79_subject_9":{"attribute_name":"日本十進分類法","attribute_value_mlt":[{"subitem_subject":"547","subitem_subject_scheme":"NDC"}]},"item_79_version_type_21":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open 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ヒデキ","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{},{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[],"affiliationNames":[{"affiliationName":""}]}],"creatorNames":[{"creatorName":"鏡,  愼","creatorNameLang":"ja"},{"creatorName":"KAGAMI, Shin","creatorNameLang":"en"},{"creatorName":"カガミ, シン","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-02-15"}],"displaytype":"detail","filename":"jsaem19_348_2011.pdf","filesize":[{"value":"1.1 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"jsaem19_348_2011.pdf","objectType":"fulltext","url":"https://muroran-it.repo.nii.ac.jp/record/7118/files/jsaem19_348_2011.pdf"},"version_id":"3197ba69-b4f0-4fe3-a40a-ce2f82224779"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Plasma semi-conductor process","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Surface wave plasma","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"FDTD simulation","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Self-consistent analysis","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal 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