@article{oai:muroran-it.repo.nii.ac.jp:00007663,
 author = {井上, 泰一 and INOUE, Taiichi and 南條,  淳二 and NANJO, Junji and 野村, 滋 and NOMURA, Shigeru and 原, 進一 and HARA, Shin-ichi},
 issue = {1},
 journal = {室蘭工業大学研究報告. 理工編, Memoirs of the Muroran Institute of Technology. Science and engineering},
 month = {Jul},
 note = {application/pdf},
 pages = {37--53},
 title = {陽極酸化法によるシリコン酸化膜のピンホール発生機構の考察},
 volume = {7},
 year = {1970},
 yomi = {イノウエ, タイイチ and ナンジョウ, ジュンジ and ノムラ, シゲル and ハラ, シンイチ}
}