@article{oai:muroran-it.repo.nii.ac.jp:00007721,
 author = {菖蒲,  明己 and Ayame,  Akimi and 伊東, 良将 and ITO, Yoshimasa and 金塚, 高次 and KANAZUKA, Takatsugu and 加納,  久雄 and KANO, Hisao},
 issue = {3},
 journal = {室蘭工業大学研究報告. 理工編, Memoirs of the Muroran Institute of Technology. Science and engineering},
 month = {Sep},
 note = {application/pdf},
 pages = {767--776},
 title = {エチレン接触酸化反応における生成物質の反応阻害},
 volume = {7},
 year = {1972},
 yomi = {アヤメ, アキミ and イトウ, ヨシマサ and カナズカ, タカツグ and カノウ, ヒサオ}
}