@article{oai:muroran-it.repo.nii.ac.jp:00007728,
 author = {大竹, 信行 and OTAKE, Nobuyuki and 南條,  淳二 and NANJO, Junji and 野村, 滋 and NOMURA, Shigeru and 原, 進一 and HARA, Shin-ichi},
 issue = {3},
 journal = {室蘭工業大学研究報告. 理工編, Memoirs of the Muroran Institute of Technology. Science and engineering},
 month = {Sep},
 note = {application/pdf},
 pages = {679--691},
 title = {赤外線吸収と電子線回折法によるSi陽極酸化膜の構造評価},
 volume = {7},
 year = {1972},
 yomi = {オオタケ, ノブユキ and ナンジョウ, ジュンジ and ノムラ, シゲル and ハラ, シンイチ}
}