@article{oai:muroran-it.repo.nii.ac.jp:00007901,
 author = {小山, 聡 and KOYAMA, Satoshi and 梶原, 義則 and KAJIWARA, Yoshinori and 南條,  淳二 and NANJO, Junji and 野村, 滋 and NOMURA, Shigeru and 原, 進一 and HARA, Shin-ichi},
 issue = {3},
 journal = {室蘭工業大学研究報告. 理工編, Memoirs of the Muroran Institute of Technology. Science and engineering},
 month = {Nov},
 note = {application/pdf},
 pages = {623--630},
 title = {ガスプラズマによるSi及びSiO2膜のエッチング},
 volume = {9},
 year = {1978},
 yomi = {コヤマ, サトシ and カジワラ, ヨシノリ and ナンジョウ, ジュンジ and ノムラ, シゲル and ハラ, シンイチ}
}