@article{oai:muroran-it.repo.nii.ac.jp:00007992,
 author = {南條,  淳二 and NANJO, Junji and 小林, 研 and KOBAYASHI, Ken and 木村, 洋一 and KIMURA, Yoichi and 野村, 滋 and NOMURA, Shigeru and 原, 進一 and HARA, Shin-ichi},
 issue = {5},
 journal = {室蘭工業大学研究報告. 理工編, Memoirs of the Muroran Institute of Technology. Science and engineering},
 month = {Nov},
 note = {application/pdf},
 pages = {771--781},
 title = {良質なシリコン陽極酸化膜の形成とMOSFETへの応用},
 volume = {10},
 year = {1983},
 yomi = {ナンジョウ, ジュンジ and コバヤシ, ケン and キムラ, ヨウイチ and ノムラ, シゲル and ハラ, シンイチ}
}