{"created":"2023-06-19T10:28:48.396659+00:00","id":8359,"links":{},"metadata":{"_buckets":{"deposit":"dbab2919-4c9a-4cba-9eaf-17b0616154f8"},"_deposit":{"created_by":18,"id":"8359","owners":[18],"pid":{"revision_id":0,"type":"depid","value":"8359"},"status":"published"},"_oai":{"id":"oai:muroran-it.repo.nii.ac.jp:00008359","sets":["216:408:331","35:176"]},"author_link":["52604","5749","52603","37427"],"item_77_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2002-11-30","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"154","bibliographicPageStart":"149","bibliographicVolumeNumber":"52","bibliographic_titles":[{"bibliographic_title":"室蘭工業大学紀要","bibliographic_titleLang":"ja"},{"bibliographic_title":"Memoirs of the Muroran Institute of Technology","bibliographic_titleLang":"en"}]}]},"item_77_description_23":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_77_description_7":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The sp2-bonded BN thin films were prepared onto the silicon substrate by RF ion plating under the conditions of supplied RF power of 18-110 W, substrate bias potential of -0.5kV, boron evaporation rate of 1.3 × 10-4kg/(㎡・s), vacuum chamber pressure of pN2+pAr=6.6 × 10-2Pa, and 21.7cm distance between substrate and vapar source. N/B atomic ratio of thc film increased with increases in pN2/(pN2+pAr) ratio and supplied RF power, The maximum ratio of the film oblained in this work was 0,95, when the film was prepared under the condition of supplied RF power of 110 W and pN2 =6.6×10-2Pa.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_77_description_8":{"attribute_name":"注記","attribute_value_mlt":[{"subitem_description":"投稿論文","subitem_description_language":"ja","subitem_description_type":"Other"}]},"item_77_link_5":{"attribute_name":"室蘭工業大学研究者データベースへのリンク","attribute_value_mlt":[{"subitem_link_text":"酒井 彰（SAKAI Akira）","subitem_link_url":"http://rdsoran.muroran-it.ac.jp/html/100000158_ja.html"}]},"item_77_publisher_11":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"室蘭工業大学","subitem_publisher_language":"ja"}]},"item_77_relation_15":{"attribute_name":"論文ID（NAID）","attribute_value_mlt":[{"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"110000076602","subitem_relation_type_select":"NAID"}}]},"item_77_rights_19":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"© 2002 室蘭工業大学","subitem_rights_language":"ja"}]},"item_77_source_id_12":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"13442708","subitem_source_identifier_type":"PISSN"}]},"item_77_source_id_14":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11175464","subitem_source_identifier_type":"NCID"}]},"item_77_subject_9":{"attribute_name":"日本十進分類法","attribute_value_mlt":[{"subitem_subject":"431","subitem_subject_scheme":"NDC"}]},"item_77_version_type_21":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":""}],"affiliationNames":[{"affiliationName":""}]}],"creatorNames":[{"creatorName":"佐藤,  忠夫","creatorNameLang":"ja"},{"creatorName":"SATO, Tadao","creatorNameLang":"en"},{"creatorName":"サトウ, タダオ","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":""}],"affiliationNames":[{"affiliationName":""}]}],"creatorNames":[{"creatorName":"若柳,  俊一","creatorNameLang":"ja"},{"creatorName":"WAKAYANAGI, Shun-ichi","creatorNameLang":"en"},{"creatorName":"ワカヤナギ, シュンイチ","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":""}],"affiliationNames":[{"affiliationName":""}]}],"creatorNames":[{"creatorName":"渡邉,  孝幸","creatorNameLang":"ja"},{"creatorName":"WATANABE, Takayuki","creatorNameLang":"en"},{"creatorName":"ワタナベ, タカユキ","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":""}],"affiliationNames":[{"affiliationName":""}]}],"creatorNames":[{"creatorName":"酒井,  彰","creatorNameLang":"ja"},{"creatorName":"SAKAI, Akira","creatorNameLang":"en"},{"creatorName":"サカイ, アキラ","creatorNameLang":"ja-Kana"}],"familyNames":[{},{},{}],"givenNames":[{},{},{}],"nameIdentifiers":[{},{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-02-16"}],"displaytype":"detail","filename":"52_toukou09.pdf.pdf","filesize":[{"value":"490.3 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"52_toukou09.pdf.pdf","objectType":"fulltext","url":"https://muroran-it.repo.nii.ac.jp/record/8359/files/52_toukou09.pdf.pdf"},"version_id":"1a66d00d-4689-491e-8eb5-65911099f97c"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"boron nitride films","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"RF ion plating","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"反応性RFイオンプレーティング法によるBN皮膜の形成","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"反応性RFイオンプレーティング法によるBN皮膜の形成","subitem_title_language":"ja"},{"subitem_title":"Preparation of BN Films by Ractive RF Ion Plating Method","subitem_title_language":"en"}]},"item_type_id":"77","owner":"18","path":["176","331"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2007-05-25"},"publish_date":"2007-05-25","publish_status":"0","recid":"8359","relation_version_is_last":true,"title":["反応性RFイオンプレーティング法によるBN皮膜の形成"],"weko_creator_id":"18","weko_shared_id":-1},"updated":"2023-10-23T06:08:26.037512+00:00"}