@article{oai:muroran-it.repo.nii.ac.jp:00008488,
 author = {宮本, 政明 and MIYAMOTO, Masaaki and 荒山, 岳人 and ARAYAMA, Taketo and 菅原, 陽司 and SUGAWARA, Yohji and 千田, 卓也 and CHIDA, Takuya and 菖蒲,  明己 and Ayame,  Akimi},
 journal = {室蘭工業大学紀要, Memoirs of the Muroran Institute of Technology},
 month = {Mar},
 note = {application/pdf, Self-supporting Cs and/or Re-Ag catalyst disc surfaces, which were exposed to oxygen, hydrogen, ethylene and a mixture of ethylene and oxygen at 133 Pa and 483 K in a pretreatment chamber, were measured by XPS. The oxidation states and surface layer concentrations of Cs and Re on the CsRe- Ag disc changed largely with exposing to oxygen and hydrogen, while, in exposing to ethylene and the mixture of ethylene and oxygen, their parameters were almost unchangeable. O1s spectra with large fwhm of 3.2-4.2 eV were deconvoluted into five kinds of oxygen species, of which the composition varied with exposing to oxygen and hydrogen and also with exposure time. The results described above were compared with those on Cs-Ag and Re-Ag and discussed., 学術論文},
 pages = {21--35},
 title = {133 Paの酸素, 水素, エチレンに接触させたCsおよびRe添加Ag触媒表面のXPS分析},
 volume = {59},
 year = {2010},
 yomi = {ミヤモト, マサアキ and アラヤマ, タケト and スガワラ, ヨウジ and チダ, タクヤ and アヤメ, アキミ}
}