{"created":"2023-06-19T10:28:57.865947+00:00","id":8581,"links":{},"metadata":{"_buckets":{"deposit":"7fad44c9-1575-431a-8a57-5eccc483b13c"},"_deposit":{"created_by":18,"id":"8581","owners":[18],"pid":{"revision_id":0,"type":"depid","value":"8581"},"status":"published"},"_oai":{"id":"oai:muroran-it.repo.nii.ac.jp:00008581","sets":["216:245","48"]},"author_link":["46805","59466"],"item_1694052902339":{"attribute_name":"会議記述","attribute_value_mlt":[{"subitem_conference_date":{"subitem_conference_start_year":"2015"},"subitem_conference_names":[{"subitem_conference_name":"Dynamics & Design Conference","subitem_conference_name_language":"en"}]}]},"item_82_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2015-08-24","bibliographicIssueDateType":"Issued"},"bibliographicVolumeNumber":"2015","bibliographic_titles":[{"bibliographic_title":"Dynamics & Design Conference","bibliographic_titleLang":"en"}]}]},"item_82_description_23":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_82_description_7":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The shutter of camera is a device that contols exposure time for the image sensor. A focal-plain-shutter is currently mainstream model of SLR Camera. The uneven-exposure is rarely occur at the manufacturing stage in the focal-plain-shutter. The uneven-exposure is phenomenon that photographs isn't able to be exposed. The unevenness-exposue cause is vibration of the shutter-blades. The cause of vibration is the gap between the shutter blades and pins. To reveal cause of the uneven-exposure, this study focuses on the backlash of arm with drive-unit. This study uses shutter-blades model for simple experiment.The experimental apparatus can drive the shutter-blade model with slider at high speed by spring force. To reveal the behavior during transient moving， two laser-displacement-meters measure the displacement gap of shutter-blade-model and slider.The results or experiments，it become clear that center of gravity and backlash size of shutter-blades model are important parameters. Rebound amount and interval time of peak to peak decrees as the backlash is decrees.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_82_description_8":{"attribute_name":"注記","attribute_value_mlt":[{"subitem_description":"ROMBUNNO.155","subitem_description_language":"en","subitem_description_type":"Other"}]},"item_82_link_5":{"attribute_name":"室蘭工業大学研究者データベースへのリンク","attribute_value_mlt":[{"subitem_link_text":"松本 大樹（MATSUMOTO Hiroki）","subitem_link_url":"http://rdsoran.muroran-it.ac.jp/html/100000048_ja.html"}]},"item_82_publisher_11":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"日本機械学会","subitem_publisher_language":"ja"}]},"item_82_rights_19":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"© 2015 日本機械学会","subitem_rights_language":"ja"}]},"item_82_source_id_14":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA1261855X","subitem_source_identifier_type":"NCID"}]},"item_82_subject_9":{"attribute_name":"日本十進分類法","attribute_value_mlt":[{"subitem_subject":"535","subitem_subject_scheme":"NDC"}]},"item_82_version_type_21":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"今関, 崇一朗","creatorNameLang":"ja"},{"creatorName":"IMAZEKI, Soichiro","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"46805","nameIdentifierScheme":"WEKO"}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"10103","affiliationNameIdentifierScheme":"kakenhi"}],"affiliationNames":[{"affiliationName":"室蘭工業大学","affiliationNameLang":"ja"},{"affiliationName":"Muroran Institute of Technology","affiliationNameLang":"en"}]}],"creatorNames":[{"creatorName":"松本, 大樹","creatorNameLang":"ja"},{"creatorName":"MATSUMOTO, Hiroki","creatorNameLang":"en"},{"creatorName":"マツモト, ヒロキ","creatorNameLang":"ja-Kana"}],"familyNames":[{"familyName":"松本","familyNameLang":"ja"},{"familyName":"MATSUMOTO","familyNameLang":"en"},{"familyName":"マツモト","familyNameLang":"ja-Kana"}],"givenNames":[{"givenName":"大樹","givenNameLang":"ja"},{"givenName":"Hiroki","givenNameLang":"en"},{"givenName":"ヒロキ","givenNameLang":"ja-Kana"}],"nameIdentifiers":[{"nameIdentifier":"59466","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"1000050374757","nameIdentifierScheme":"NRID","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000050374757"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-02-22"}],"displaytype":"detail","filename":"155_aut.pdf","filesize":[{"value":"4.6 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"155_aut.pdf","objectType":"fulltext","url":"https://muroran-it.repo.nii.ac.jp/record/8581/files/155_aut.pdf"},"version_id":"5809fabe-692d-4798-826b-4f5e755569df"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"SLR camera","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Focal plain shutter","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Backlash","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Transient moving","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Unevenness exposure","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"conference paper","resourceuri":"http://purl.org/coar/resource_type/c_5794"}]},"item_title":"フォーカルプレーンシャッターにおける露光ムラを抑制するための設計因子の検討","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"フォーカルプレーンシャッターにおける露光ムラを抑制するための設計因子の検討","subitem_title_language":"ja"},{"subitem_title":"Examination of Design Factor for Suppression of Unevenness Exposure with regards to Focal-plane shutter","subitem_title_language":"en"}]},"item_type_id":"82","owner":"18","path":["48","245"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2016-02-04"},"publish_date":"2016-02-04","publish_status":"0","recid":"8581","relation_version_is_last":true,"title":["フォーカルプレーンシャッターにおける露光ムラを抑制するための設計因子の検討"],"weko_creator_id":"18","weko_shared_id":-1},"updated":"2023-10-24T23:58:02.509916+00:00"}